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Jülich DATA (Forschungszentrum Jülich GmbH)
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Fabrication Optimization of Suspended Stencil Mask Lithography for Multi-Terminal Josephson Junctions
Fabrication Optimization of Suspended Stencil Mask Lithography for Multi-Terminal Josephson Junctions
Dec 16, 2025 - Peter Grünberg Institute – Semiconductor Nanoelectronics (PGI-9)
Teller, Justus; Jalil, Adur Reman; Lentz, Florian; Grützmacher, Detlev; Schäpers, Thomas, 2025, "Fabrication Optimization of Suspended Stencil Mask Lithography for Multi-Terminal Josephson Junctions", https://doi.org/10.26165/JUELICH-DATA/7WRRRH, Jülich DATA, V1
Stencil mask lithography is an advanced technique for fully in-situ fabricating Josephson junctions, which is increasingly being used for multi-terminal Josephson junctions. This study provides information on the optimal mask design and mask reliability. For this, 270 mask design...
Analysis_Ch1L1.xlsx
MS Excel Spreadsheet - 10.2 KB - SHA-256: 840c37c9fef6bb2072f53de4c187fe3fcbb369bbac6aa39e51b58a1b72ffd1ec
Analysis_Ch1L2.xlsx
MS Excel Spreadsheet - 10.2 KB - SHA-256: adf4030e1960c3ab4d9f6f9ef81c174f0e68d26d033b70128058c89d1b761247
Analysis_Ch2L1.xlsx
MS Excel Spreadsheet - 10.2 KB - SHA-256: 117eb7b8ca3bebe281306917a248b92b9002c1a5168e177f53e32bfb687f66ee
Analysis_Ch2L2.xlsx
MS Excel Spreadsheet - 10.2 KB - SHA-256: 7a2c54c17924a1403d63e937cc1a978d4ffa337433a8db602081974681fa51a6
L1_aw100_01-1.tif
TIFF Image - 2.3 MB - SHA-256: 3a1375a1128084e2d08c59632a74d57b36cdf72997ee93b1118d1d8d05afafc8
L1_aw100_01.tif
TIFF Image - 2.3 MB - SHA-256: 0ef0dc76068fb574ec083cdc1e0875266495a74ee840280658e86862290c7eb9
L1_aw100_2TJJ_01-1.tif
TIFF Image - 2.3 MB - SHA-256: c8e6e51a6657b608b245a9f24c3feb8ff98ea2c7d705d623aa79b5fefc1fdad3
L1_aw100_2TJJ_01.tif
TIFF Image - 2.3 MB - SHA-256: be343abcf08df817ee682be566a1061a8c19b6099d877d97627412452c918e84
L1_aw100_2TJJ_02-1.tif
TIFF Image - 2.3 MB - SHA-256: cba35ab1466a5471065c2b24d70b93dab187d48895b0f5976aaf54977fb10246
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