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Peter Grünberg Institute – Semiconductor Nanoelectronics (PGI-9) (Forschungszentrum Jülich )
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Raw_data_SampleC.csv
Comma Separated Values - 7.6 MB - SHA-256: 8dc40ad57930615fc8ec3a405a0305f23de669fe4caf7a20972cef589f311401
Raw_data_SampleD.csv
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Raw_data_SampleE.csv
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Fabrication Optimization of Suspended Stencil Mask Lithography for Multi-Terminal Josephson Junctions
Fabrication Optimization of Suspended Stencil Mask Lithography for Multi-Terminal Josephson Junctions
Dec 18, 2025
Teller, Justus; Jalil, Adur Reman; Lentz, Florian; Grützmacher, Detlev; Schäpers, Thomas, 2025, "Fabrication Optimization of Suspended Stencil Mask Lithography for Multi-Terminal Josephson Junctions", https://doi.org/10.26165/JUELICH-DATA/7WRRRH, Jülich DATA, V2
Stencil mask lithography is an advanced technique for fully in-situ fabricating Josephson junctions, which is increasingly being used for multi-terminal Josephson junctions. This study provides information on the optimal mask design and mask reliability. For this, 270 mask design...
Analysis_Ch1L1.xlsx
MS Excel Spreadsheet - 10.2 KB - SHA-256: 840c37c9fef6bb2072f53de4c187fe3fcbb369bbac6aa39e51b58a1b72ffd1ec
Analysis_Ch1L2.xlsx
MS Excel Spreadsheet - 10.2 KB - SHA-256: adf4030e1960c3ab4d9f6f9ef81c174f0e68d26d033b70128058c89d1b761247
Analysis_Ch2L1.xlsx
MS Excel Spreadsheet - 10.2 KB - SHA-256: 117eb7b8ca3bebe281306917a248b92b9002c1a5168e177f53e32bfb687f66ee
Analysis_Ch2L2.xlsx
MS Excel Spreadsheet - 10.2 KB - SHA-256: 7a2c54c17924a1403d63e937cc1a978d4ffa337433a8db602081974681fa51a6
Ch1,L1.zip
ZIP Archive - 238.6 MB - SHA-256: 0e8d890f28e3a36f33ea068c81506a463294af4be443d31b71d6ed84df66c76c
Ch1,L2.zip
ZIP Archive - 247.8 MB - SHA-256: b8350acee171c0bab223bd314ba208f2672eb14061c3a8f5fb4d65194603ed81
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